DRY PROCESS SCHOOL

Program (Tentative)

Day 1: Nov. 11, 2025
(Media Hall, CITE)

    09:10 - 09:15 Opening
  1. 09:15 - 10:45
    "Semiconductor industry: present and future"
    Richard Gottscho (SemiSan: retired CTO Lam Research)
  2. 11:15 - 12:45
    "Plasma physics for semiconductor processing"
    Zoltán Donkó (Wigner Research Centre for Physics)
  3. 12:45 - 14:15 Lunch break (lunch will be served)
  4. 14:15 - 15:45
    "Gas-phase chemistry for plasma processing"
    Mark J. Kushner (U. Michigan, Ann Arbor)
  5. 16:15 - 17:45
    "Etching technologies"
    Rémi Dussart (U. Orléans)

Reception: Nov. 11, 2025
(Location: Maple )

18:00 - 20:00

Day 2: Nov. 12, 2025
(Media Hall, CITE)

  1. 09:00 - 10:30
    "Semiconductor device technologies"
    Masaharu Kobayashi (U. Tokyo)
  2. 11:00 - 12:30
    "Plasma-surface interactions and surface chemistry"
    Vincent Donnelly (U. Houston)
  3. 12:30 - 14:00 Lunch break (lunch will be served)
  4. 14:00 - 15:30
    "Atomic layer processes"
    Christophe Vallee (U. Albany)
  5. 16:00 - 17:30
    "TCAD and data-scientific approach to semiconductor processing"
    Byungjo Kim (Ulsan National Institute of Science & Technology)
  6. 17:30 - 17:40 Closing